High Voltage

High-Voltage precision supplies for semiconductor and analytical equipment

BRING ADVANCED INNOVATIONS TO LIFE WITH SIOUX PRECISION HIGH-VOLTAGE CONTROL

50+ YEARS IN HIGH-TECH SYSTEMS
Working for leading companies in semicon, medical & analytical.
FULL LIFECYCLE SOLUTIONS
From architecture to production at scale.
FULL SYSTEM ENGINEERING
Hardware, software and integration.

Shrinking nodes demand higher measurement accuracy

As semiconductor devices continue to shrink, the demand for advanced electron-beam metrology and inspection systems continues to grow. Applications such as CD-SEM, defect review and wafer inspection require exceptional beam stability to deliver the measurement accuracy needed for next-generation process control.

Transition to advanced device architectures

Advanced electron-optical systems increasingly rely on precise control of beam energy, landing energy, and electrostatic lens configurations. As multi-beam and low-energy inspection techniques become mainstream, voltage ripple, drift, and channel matching become critical performance parameters. High-voltage stability is no longer a component specification but a key enabler of imaging and inspection performance.

Improving Quantitative Accuracy

Advanced mass spectrometry applications require exceptional measurement repeatability across long analytical runs. Voltage drift and noise can influence ion transmission efficiency and detector response, impacting quantitative accuracy. High-stability power supplies help ensure consistent analytical results and reduced recalibration requirements.

Increased System Integration and Miniaturization

As analytical instruments and semiconductor equipment become more compact, manufacturers must integrate more functionality into smaller footprints without compromising performance. High-voltage power systems are expected to deliver greater precision, lower noise, higher power density, and enhanced safety within increasingly constrained space envelopes.

Solutions details

Summary

- Delivers ultra-low ripple and ppm-level stability for precise electron beam control.
- Supports advanced SEM, metrology, and wafer inspection systems with flexible multi-output configurations.
- Combines compact integration, industrial safety, and customizable architecture in a single platform.

Application

Designed for advanced electron-beam systems including SEM, CD-SEM, wafer inspection, defect review, and metrology platforms. The Sioux High-Voltage Precision Supply enables precise beam energy control and supports next-generation semiconductor process control, where stability, defect sensitivity, and measurement repeatability are critical.

Availability

Available as a configurable platform supporting Field Emission and Thermionic electron sources and even Ion sources. The modular architecture allows customization of output voltages, communication interfaces, safety functions, and form factor, enabling seamless integration into OEM electron microscopy, metrology, and inspection systems.

Contact sales

Ultra-Stable High-Voltage Performance

Delivers ppm-level voltage stability and ultra-low output ripple to ensure exceptional electron beam stability, reduced drift, and highly repeatable imaging and measurement performance.

Integrated Multi-Output Platform

Combines accelerator, suppressor, extractor, and filament supplies in a single modular platform, simplifying integration and reducing system complexity for Electron Beam manufacturers.

Designed for Advanced Electron Optics

Supports demanding SEM, metrology, and wafer inspection applications where beam quality, measurement accuracy, and long-term stability are critical.

Flexible OEM Integration

Modular architecture enables customization of voltage ranges, communication interfaces, safety functions, and form factors to fit application-specific requirements.