UPSS 1.0 Stage with Air Bearing System

The customer’s challenge

High-precision applications require accurate positioning, fast responses and stable static and dynamic performance. The positioning system must support long-range X&Y movements, fine orthogonality adjustments and accurate Z and rotational positioning, while fitting within strict space requirements. Isolation, force cancellation and active leveling are needed to support a high level of dynamic response.

Sioux’s contribution

Sioux combines frictionless air bearing stages, static and dynamic structural design, and Sioux sMA-RT control technology in the UPSS 1.0.

• X&Y Positioning System: Gantry-type X&Y stages support long-range movements, with yaw control for fine orthogonality adjustments.

• Z&Rz Positioning System: A compact design accommodates strict space requirements. The Z axis uses a servo system with Sioux sMA-RT control technology for real-time, high-accuracy positioning. The Rz axis combines high rotational resolution with a stiff braking system.

• Active Isolation System: The system combines isolation with force cancellation and active leveling to support a high level of dynamic response.

• SAXCS Control Platform: A flexible control platform tailored to customer requirements. Sioux’s control system experts can customize the core control algorithms to address application challenges. Model-based development and high compatibility with commercial off-the-shelf (COTS) components support fast time to market and reliable solutions.

Result

• Static and dynamic performance: The structural design, frictionless air bearing stages and Sioux sMA-RT control technology deliver superior static and dynamic performance, with fast responses and low velocity ripple.

• Accurate Z and rotational positioning: Real-time, high-accuracy Z positioning and high-resolution Rz positioning, with a stiff braking system that eliminates rotational resonances.

• Reduced settling time: Active isolation can improve settling time by more than 80% compared with operation without active isolation.

• Application flexibility: Suitable for scanning, wafer inspection, wafer metrology, photonics and flat panel display manufacturing.

• Cleanliness compatibility: Compatible with Class 100 cleanliness requirements.

Technology

• Four-axis positioning: X, Y, Z and Rz

• Frictionless air bearing stages

• Gantry-type X&Y stages with yaw control

• Sioux sMA-RT control technology

• Z-axis servo control

• High-resolution Rz positioning with stiff braking

• Active isolation, force cancellation and active leveling

• SAXCS control platform

• Customizable control algorithms

• Model-based development

• Compatibility with commercial off-the-shelf (COTS) components

Specification | UPSS 1.0 XY Stage

* Higher accuracy is available upon requests.

Specification | UPSS 1.0 Z&Rz Stage